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Voltage-testing of thin-film capacitorsBERLICKI, T. M.IEEE transactions on reliability. 1984, Vol 33, Num 3, pp 205-207, issn 0018-9529Article

Untersuchung der elektrischen Eigenschaften von Dünnschichtkondensatoren aus plasmapolymerisierten Tetrafluorethen = Etude des propriétés électriques de condensateurs en couches minces de tétrafluoréthylène polymérisé dans un plasma = A study of the electrical properties of thin film capacitors made of plasma polymerized tetrafluoroethyleneBLASCHTA, F; MAI, J; SCHÖNFELDER, A et al.Wissenschaftliche Zeitschrift der Technischen Hochschule Karl-Marx-Stadt. 1984, Vol 26, Num 5, pp 665-671, issn 0372-7610Article

Leakage and breakdown in thin oxide capacitors: correlation with decorated stacking faultsLIN, P. S. D; MARCUS, R. B; SHENG, T. T et al.Journal of the Electrochemical Society. 1983, Vol 130, Num 9, pp 1878-1883, issn 0013-4651Article

Voltage degradation model of thin film capacitorsBERLICKI, T. M.Active and passive electronic components. 1985, Vol 12, Num 1, pp 63-70Article

High-capacitance series and ultra-thin series multilayer ceramic chip capacitorsSUZUKI, J; TOKUMARU, T; KAWAMURA, M et al.NEC research & development. 1987, Num 84, pp 131-139, issn 0547-051XArticle

High frequency performance of Ta-Al-N capacitors made with an aluminum underlayerREDDY, P. K; JAWALEKAR, S. R.Thin solid films. 1983, Vol 109, Num 4, pp 339-343, issn 0040-6090Article

MAKE THE MOST OF PROPERTIES OF FILM CAPACITORSMIMURA K.1982; JEE. JOURNAL OF ELECTRONIC ENGINEERING; ISSN 0385-4507; JPN; DA. 1982; VOL. 19; NO 191; PP. 40-43Article

RELIABILITY OF MKT STACKED FILM CAPACITORSFINGER B.1980; SIEMENS COMPON.; DEU; DA. 1980; VOL. 15; NO 3; PP. 134-135; BIBL. 2 REF.Article

USE OF LEAD DIOXIDE COUNTERELECTRODES IN THIN-FILM CAPACITORS: THE TLM COMPACITORPARISI GI.1972; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1972; VOL. 8; NO 3; PP. 33-38; BIBL. 8 REF.Serial Issue

PRODUCING HIGH-K THICK-FILM CAPACITORSWEINBERG BJ.1979; ELECTRON. PACKAGE. PRODUCT.; USA; DA. 1979; VOL. 19; NO 6; PP. 140-144; BIBL. 4 P.Article

ELECTRICAL PROPERTIES OF THIN-FILM AL-CEF3-AL CAPACITORS.KALRA AD; SIMMONS JG; NADKARNI GS et al.1975; J. APPL. PHYS.; U.S.A.; DA. 1975; VOL. 46; NO 12; PP. 5076-5079; BIBL. 5 REF.Article

GEDRUCKTE KONDENSATOREN IN DICKSCHICHTTECHNIK. = CONDENSATEURS IMPRIMES EN TECHNIQUE DES COUCHES MINCESISERT H.1975; F. U. M.; DTSCH.; DA. 1975; VOL. 83; NO 4; PP. 173-178; ABS. ANGL. FR.; BIBL. 9 REF.Article

FILM CAPACITORS WITH LOW INTERNAL INDUCTANCE.LOESCHER DH; SIDNELL NA.1977; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1977; VOL. 13; NO 4; PP. 399-402; BIBL. 7 REF.Article

CONDENSATEUR A COUCHE MINCE AVEC COUCHE DIELECTRIQUE DE TA2O5KAMPA J; OBUCHOWICZ E; PETRUS K et al.1974; PRACE OSRODKA BADAWCZO-ROZWOJOW. ELEKTRON. PROZNIOW.; POLSKA; DA. 1974; VOL. 2; NO 2; PP. 39-46; ABS. ANGL. RUSSE; BIBL. 7 REF.Article

THE INFLUENCE OF THE AREA OF A THIN FILM CAPACITOR ON THE BREAKDOWN VOLTAGEBERLICKI T.1981; ELECTROCOMPON. SCI. TECHNOL.; ISSN 0305-3091; GBR; DA. 1981; VOL. 9; NO 2; PP. 111-114; BIBL. 4 REF.Article

DIE EIGENSCHAFTEN VON TANTAL-DUENNFILM-KONDENSATOREN BEI UNTERSCHIEDLICHER STICKSTOFFDOTIERUNG IN ABHAENGIGKEIT VON FREQUENZ UND GLEICHVORSPANNUNG. = LES PROPRIETES DE CONDENSATEURS A COUCHES MINCES EN TANTALE AVEC DIVERS DOPAGES AVEC DE L'AZOTE, EN FONCTION DE LA FREQUENCE ET DE LA TENSION DE POLARISATION CONTINUEANDERS W.1975; FREQUENZ; DTSCH.; DA. 1975; VOL. 29; NO 5; PP. 133-136; ABS. ANGL.; BIBL. 10 REF.Article

AGING OF HIGHLY N-DOPED ALPHA -TA THIN FILM CAPACITORSWYATT PW.1978; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1978; VOL. 1; NO 2; PP. 148-151; BIBL. 10 REF.Article

CAPACITORS OF THIN INSULATING FILMS OF PHOTORESIST MATERIALSSINGH A.1978; MICROELECTRON. AND RELIABIL.; GBR; DA. 1978; VOL. 17; NO 4; PP. 441-444; BIBL. 24 REF.Article

PROPERTIES AND RELIABILITY OF TANTALUM OXIDE THIN FILM CAPACITOR.MATSUMOTO T; SUGITA E.1975; REV. ELECTR. COMMUNIC. LAB.; JAP.; DA. 1975; VOL. 23; NO 3-4; PP. 257-270; BIBL. 7 REF.Article

PROPERTIES OF LOW ANODIZATION VOLTAGE THIN-FILM CAPACITORS BASED ON ALPHA -TA WITH NITROGEN CONCENTRATIONS BETWEEN 14 AND 30 ATOMIC PERCENTROTTERSMAN MH; PITETTI RC; ADOLT AR et al.1980; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; ISSN 0148-6411; USA; DA. 1980; VOL. 3; NO 4; PP. 500-504; BIBL. 8 REF.Article

A METHOD OF REDUCING COST IN THE PRODUCTION OF HIGH STABILITY THIN-FILM RC NETWORKSARCIDIACONO FR; DUFF OJ; KOERCHEL GJ et al.1980; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; ISSN 0148-6411; USA; DA. 1980; VOL. 3; NO 4; PP. 492-499; BIBL. 11 REF.Article

COMPATIBLE THIN FILM CAPACITORS.BUTTOO RS; MURTHY BS.1974; INDIAN J. TECHNOL.; INDIA; DA. 1974; VOL. 12; NO 1; PP. 13-15; BIBL. 3 REF.Article

A STUDY OF DIELECTRIC LOSS MECHANISMS IN ZINC SULPHIDE THIN FILM CAPACITORSWILLOUGHBY AFW; YUEN FC.1972; THIN SOLID FILMS; NETHERL.; DA. 1972; VOL. 13; NO 1; PP. 199-205; BIBL. 8 REF.Serial Issue

INSULATOR CHARGE AND VFB STABILITY OF SNOS CAPACITORS.BARILE CA; DOCKERTY RC; NAGARAJAN A et al.1974; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1974; VOL. 121; NO 7; PP. 907-911; BIBL. 12 REF.Article

TANTALIUM THIN FILM CAPACITORS WITH VARIOUS TYPES OF COUNTERELECTRODESFERRARIS GP; MAY R.1979; EUROPEAN HYBRID MICROELECTRONICS CONFERENCE. 2/1978/GHENT; NLD; PIJNACKER: DUTCH EFFICIENCY BUREAU; DA. 1979; PP. 161-169; BIBL. 10 REF.Conference Paper

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